Preparation of CVD diamond coatings on gamma titanium aluminide using MPECVD with various interlayers |
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Authors: | Saleh B Abu Suilik Masayuki Ohshima Kazuhiro Hasezaki |
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Affiliation: | a Department of Materials Science, Shimane University, Nishikawatsu-cho 1060, Matsue, Shimane 690-8504, Japan b Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan |
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Abstract: | CVD diamond coatings were deposited on to γ-TiAl surfaces using a microwave plasma enhanced CVD to improve wear properties and the performance of γ-TiAl. Diamond coatings were directly deposited on to γ-TiAl substrates and deposited on to TiC, Ti5Si3, Al2O3 + TiO2, and Si interlayers prepared on γ-TiAl substrates. The diamond coatings deposited directly on γ-TiAl suffered severe delamination and cracked. Those deposited on TiC and Ti5Si3 interlayers partially delaminated, whereas those deposited on Al2O3 + TiO2 and Si interlayers adhered well to the underlying surfaces. The diamond films obtained were characterized using scanning electron microscopy, Raman spectroscopy, and X-ray diffraction. Raman spectra showed that polycrystalline and nanocrystalline diamond films grew on γ-TiAl. Residual internal stresses of the diamond coatings deposited on interlayered-γ-TiAl were estimated experimentally from Raman spectra. The coatings prepared on Al2O3 + TiO2/γ-TiAl and Si/γ-TiAl showed lower residual stresses. |
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Keywords: | Gamma titanium aluminide CVD diamond coatings MPECVD Residual stresses Interlayers |
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