Mo SILICIDE SYNTHISIS BY DUAL ION BEAM DEPOSITION |
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| Authors: | T.H.Zhang Z.Z.Yi X.Y.Wu S.J.Zhang Y.G.Wu X.Zhang H.X.Zhang A.D.Liu X.J.Zhang |
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| Affiliation: | Key Laboratory for Radiation Beam Technology and Material Modification,Institute of Low Energy Nuclear Physics,Beijing Normal University,Beijing Radiation Center,Beijing 100875,China |
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| Abstract: | Mo silicides MosSi3 with high quality were prepared using ion beam deposition equip-ment with two Filter Metal Vacuum Arc Deposition (FMEVAD). When the numberof alternant deposition times was 198, total thickness of the coating is 40nm. Thecoatings with droplet free can be readily obtained, so the surface is smooth. TEMobservation shows that Mo and Si alternant deposition coating is conpact structure.The fine Mo silicide grains densely distributed in the coating. The coating adherenceon silicon is excellent. |
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| Keywords: | Mo silicide ion alternant deposition silicon |
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