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Nanocrystallisation of TiO2 induced by dense electronic excitation
Authors:Madhavi Thakurdesai  A Mahadkar  Varsha Bhattacharyya
Affiliation:a Department of Physics, University of Mumbai, Santacruz (E), Mumbai 400098, India
b Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India
c Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India
Abstract:Amorphous thin films of TiO2 grown by pulsed laser deposition and thermal evaporation method are irradiated by swift heavy ions. Nanocrystallisation is induced by dense electronic excitation in films grown by both the methods. The surface morphology is studied by atomic force microscopy (AFM). Hillocks-like nanostructures emerge on the surface of irradiated films. Glancing angle X-ray diffraction (GAXRD) and Raman spectroscopy are carried out for phase identification. Optical characterisation is done by UV-vis absorption spectroscopy. Increase in bandgap after irradiation indicates quantum confinement of nanoparticles. Mechanism behind amorphous to nanocrystalline phase transition is discussed.
Keywords:61  80  &minus  x  61  82  Rx  68  37  Ps  78  30  &minus  j
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