| ESD与EMP对微波晶体管损伤机理研究 |
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| 引用本文： | 刘红兵,王长河,赵彤,李用兵,杨洁.ESD与EMP对微波晶体管损伤机理研究[J].半导体技术,2008,33(8). |
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| 作者姓名： | 刘红兵 王长河 赵彤 李用兵 杨洁 |
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| 作者单位： | 中国电子科技集团公司,第十三研究所,石家庄,050051;中国人民解放军,军械工程学院,石家庄,050003 |
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| 摘 要： | 主要论述了电子装备中易受静电放电(ESD)和电磁脉冲(EMP)损伤的微波半导体器件的失效模式和失效机理.实验与理论分析结果表明,电流放大系数hFE是ESD、EMP损伤的敏感参数;在ESD、EMP的作用下,器件进入雪崩击穿状态(反偏注入),从而诱发热电子注入效应,使hFE逐渐退化;BC结反偏时的失效能量低于EB结反偏时的失效能量,BC结是EMP损伤的较易损端口;改进器件的结构设计、提高器件抗ESD、EMP能量,可有效提高电子装备抗电磁脉冲的可靠性水平.
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| 关 键 词： | 静电放电 电磁脉冲 辐射损伤 |
Study on the Effect of ESD and EMP Radiation Damage on Microwave Semiconductor Devices |
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| Liu Hongbing,Wang Changhe,Zhao Tong,Li Yongbing,Yang Jie.Study on the Effect of ESD and EMP Radiation Damage on Microwave Semiconductor Devices[J].Semiconductor Technology,2008,33(8). |
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| Authors: | Liu Hongbing Wang Changhe Zhao Tong Li Yongbing Yang Jie |
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| Affiliation: | Liu Hongbing1,Wang Changhe1,Zhao Tong1,Li Yongbing1,Yang Jie2(1.The 13th Research Institute,CETC,Shijiazhuang 050051,China,2.Ordnance Engineering Collage of PLA,Shijiazhuang 050003,China) |
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| Abstract: | Damages caused by ESD or EMP on microwave semiconductor devices were discussed,and their main failure model and mechanisms were analyzed.The experimental and analysis results show that current amplification factor hFE is a more sensitive parameter of ESD or EMP;effected by ESD or EMP,the device will break into avalanche breakdown,which sequentially incite the injection effect of hot electron and finally result in degeneration of hFE;it is proved that BC junction is easier to be damaged than EB junction by E... |
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| Keywords: | ESD EMP radiation damage |
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