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Growth and characterization of indium oxide thin films prepared by spray pyrolysis
Affiliation:1. Laboratorio de Películas Delgadas, Escuela Profesional de Física, Universidad Nacional de San Agustín de Arequipa, Av. Independencia s/n, Arequipa, Perú;2. Núcleo de Física Aplicada, Instituto de Física, Universidade de Brasília, Brasília DF 70910900, Brazil;3. Departamento de Física, IGCE, Universidade Estadual Paulista, Rio Claro 13506-900 SP, Brazil;4. Departamento de Física, Centro de Ciências Exatas e de Tecnologia, Universidade Federal de São Carlos, São Carlos, SP 13565-905, Brazil
Abstract:Highly transparent and conducting indium oxide thin films are prepared on glass substrates from precursor solution of indium chloride. These films are characterized by X-ray diffraction, scanning electron microscopy and optical transmission. The preferential orientation of these films is found to be sensitive to deposition parameters. A comparative study has been made on the dependence on the thickness of the film on substrate temperatures with aqueous solution and 1:1 C2H5OH and H2O as precursors. Films deposited at optimum conditions have 167 nm thickness and exhibited a resistivity of 2.94 × 10−4 Ω m along with transmittance better than 82% at 550 nm. The analytical expressions enabling the derivation of the optical constants of these films from their transmission spectrum only have successfully been applied. Finally, the refractive index dispersion is discussed in terms of the single-oscillator Wemple and Didomenico model.
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