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First gaseous boronization during pulsed discharge cleaning

Authors:	J Ko DJ Den Hartog JA Goetz PJ Weix ST Limbach

Affiliation:	1. INFN Laboratori Nazionali di Legnaro, Viale dell’Università 2, 35020 Legnaro (PD), Italy;2. Università di Padova, Dipartimento di Scienze Chimiche, via Marzolo 1, 35131 Padova, Italy;3. Università di Padova, Dipartimento di Fisica e Astronomia, via Marzolo 8, 35131 Padova, Italy;4. Università di Padova, Dipartimento di Tecnica e Gestione dei Sistemi Industriali, Stradella S. Nicola 3, 36100 Vicenza, Italy;5. Università di Padova, Dipartimento di Ingegneria Industriale, via Marzolo 9, 35131 Padova, Italy;1. Department of Mechanical Engineering, University of Michigan, Ann Arbor, MI 48109, United States;2. Department of Materials Science & Engineering, University of Michigan, Ann Arbor, MI 48105, United States;1. U.A. Combustibles Nucleares, Comisión Nacional de Energía Atómica, Avenida del Libertador 8250, 1429 Buenos Aires, Argentina;2. U.A. Reactores Nucleares, Comisión Nacional de Energía Atómica, Avenida del Libertador 8250, 1429 Buenos Aires, Argentina;3. Departamento Ingeniería Nuclear, INVAP SE, Comandante Luis Piedra Buena 4950, 8430 San Carlos de Bariloche, Río Negro, Argentina;1. Dipartimento di Energia, Politecnico di Milano, Milan, Italy;2. Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Milan, Italy;3. Center for Nano Science and Technology @ Polimi, Istituto Italiano di Tecnologia, Milan, Italy;4. Dipartimento di Meccanica, Politecnico di Milano, Milan, Italy;1. Institute of Nuclear Safety System, 64 Sata, Mihama-cho, Mikata-gun, Fukui 919-1205, Japan;2. Nippon Nuclear Fuel Development, 2163 Narita-cho, Oarai-machi, Ibaraki 311-1313, Japan;1. Kyiv National Taras Shevchenko University, Faculty of Physics, 2 Glushkova Ave., 03022 Kyiv, Ukraine;2. Ivan Franko National University, Department of Metal Physics, 8 Kyrylo & Mephodiy street, 79005 Lviv, Ukraine;3. V.I. Vernadsky Institute of General and Inorganic Chemistry, 32/34 prosp. Akad. Palladina, 03680 Kyiv, Ukraine

Abstract:	The first successful gaseous boronization during a pulsed discharge is reported. Sublimation of o-carborane (C₂B₁₀H₁₂) combined with pulsed discharge plasmas with a repetition rate of 1 Hz is used to produce a hard boron-containing coating for reversed field pinch (RFP) plasmas in the Madison Symmetric Torus. X-ray photoelectron spectroscopy with Ar ion beam etching for silicon coupons installed at the plasma boundary shows about 60% boron concentration in the deposited layer. Both profilometer and scanning electron microscope analyses of the silicon coupons imply a strong toroidally non-uniform deposition depending on the location of the o-carborane injection. The layer thickness ranges from 50 to 300 nm. Ellipsometry calibrated with the profilometer results yields a refractive index of 2.2–2.3 for the films. The high refractive index implies that the coating is hard and has a well-ordered morphology. A reduction in wall recycling has consistently been observed after all boronization sessions. Comparison of the X-ray spectra in standard RFP plasmas before and after boronization indicates a slight decrease in the effective ionic charge.

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