首页 | 本学科首页   官方微博 | 高级检索  
     


Nanostructure development in polystyrene‐b‐polybutadiene‐b‐poly(methyl methacrylate) (SBM) thin films by atomic force microscopy: Effect of copolymer composition and solvent
Authors:Loli Martin  Lourdes Irusta  Alba González  Agnieszka Tercjak  Galder Kortaberria
Affiliation:1. Macrobehavior‐Mesostructure‐Nanotechnology General Research Service (SGIker), University of the Basque Country (UPV‐EHU), Donostia‐San, Sebastián, Spain;2. POLYMAT, Department of Polymer Science and Technology, University of the Basque Country (UPV‐EHU), Donostia‐San, Sebastián, Spain;3. Materials?+?Technologies' Group, University of the Basque Country (UPV/EHU), Donostia, Spain
Abstract:Surface morphology development for SBM triblock copolymer thin films has been studied by atomic force microscopy. The effect of copolymer composition and solvent on the final morphology has been investigated. Obtained results indicated that depending on the block ratio (symmetric or asymmetric with minority middle block) and solvent, lamellar, hexagonal, cylindrical, or spheres in lamellae (ls)‐type morphologies can be achieved at film surfaces. The influence of the interaction parameters among blocks and solvents and cohesive energy values of block pairs on the final morphology has been proved. POLYM. ENG. SCI., 58:422–429, 2018. © 2017 Society of Plastics Engineers
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号