Electrodeposited Cr-Doped α-Fe2O3 thin films active for photoelectrochemical water splitting

Polycrystalline hematite (α-Fe₂O₃) Chromium (Cr)-doped thin films were electrodeposited on fluorine-doped tin oxide-coated glass substrates. The electrodeposition bath comprised an aqueous solution containing FeCl₃·6H₂O, NaCl, and H₂O₂.Chromium was added to the electrolyte at such a proportion that the Cr/(Cr + Fe) ratio remained within the 2–8 at. % range. The as-deposited films were subsequently annealed in air at 650 °C for 2 h. The structure and morphological characteristics of the undoped and Cr-doped α-Fe₂O₃ thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–Vis spectroscopy. Cr doping led the main XRD lines to shift to lower angles, which mostly resulted from substituting Fe³⁺ for Cr⁴⁺ ions that leads to α-Fe₂O₃ lattice contraction. The SEM observations showed that the roughness and aspect of surfaces changed with the Cr doping level. The photoelectrochemical (PEC) performance of the α-Fe₂O₃ films was examined by chronoamperometry and linear sweep voltammetry techniques. The Cr-doped films exhibited greater photoelectrochemical activity than the undoped α-Fe₂O₃ thin films. The highest photocurrent density was obtained for the 8% Cr-doped α-Fe₂O₃ films in 1 M NaOH electrolyte. All the samples achieved their best IPCE at 400 nm. The IPCE values for the 8 at.% Cr-doped hematite films were 20-fold higher than that of the undoped sample.This Cr-doped hematite films ‘excellent photoelectrochemical performance was mainly attributed to improved charge carrier properties. Such high photoactivity was attributed to the large active surface area and increased donor density caused by increasing the Cr doping in the α-Fe₂O₃ films.