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纯钨制品中杂质的ICP-MS测定方法研究
引用本文:钟道国,潘建忠,刘鸿.纯钨制品中杂质的ICP-MS测定方法研究[J].中国钨业,2009,24(1):43-46.
作者姓名:钟道国  潘建忠  刘鸿
作者单位:赣州有色冶金研究所,江西,赣州,341000
摘    要:采用ICP-MS直接测定纯钨制品中19种杂质元素的新方法。对测定中的试液酸度、质谱干扰和基体效应进行了详细考查。采用In作内标和标准加入法,可有效地补偿钨基体的抑制效应。方法的检出限范围在0.01~0.05ng/mL;相对标准偏差(RSD)<10%;标准加入回收率95%~108%之间。

关 键 词:等离子体质谱  钨制品  杂质  内标法

Determination of Impurities in Tungsten Products by Inductively Coupled Plasma-mass Spectrometry
ZHONG Dao-guo,PAN Jian-zhong,LIU Hong.Determination of Impurities in Tungsten Products by Inductively Coupled Plasma-mass Spectrometry[J].China Tungsten Industry,2009,24(1):43-46.
Authors:ZHONG Dao-guo  PAN Jian-zhong  LIU Hong
Affiliation:(Ganzhou Nonferrous Metallurgy Institute, Ganzhou 341000, Jiangxi, China)
Abstract:A method for the determination of impurities in tungsten products by inductively coupled plasma-mass spectrometry is described. The acidity of sample solution, spectroscopic interference and matrix effect of the ICP MS method is investigated in detail.The Tungsten matrix suppression effect and sensitivity drift can be effectively compensated adopting Indium as internal standard and standardized addition method. The results show that the detection limits was in the range of 0.01-0.05 ng/mL and RSD was in the range of 1.6 %-7.6 % respectively. The recovery rate was in the range of 95 %-108 %.
Keywords:ICP-MS  tungsten products  impurities  internal standard
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