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双外延基区4H-SiC BJTs的高温特性研究
引用本文:张倩,张玉明,张义门,王悦湖.双外延基区4H-SiC BJTs的高温特性研究[J].半导体学报,2010,31(11):114005-5.
作者姓名:张倩  张玉明  张义门  王悦湖
摘    要:基于4H-SiC的材料特性及双外延基区BJTs的工作原理,依据漂移扩散及复合理论,求解在考虑4种复合机制下的双极晶体管直流增益,并通过二维仿真模型对其在高温条件下的工作特性进行了计算分析。结果表明,随着温度的升高,基区离化率的增加会导致发射极注入效率下降,从而降低器件的直流增益。同时,SiC/SiO2 界面态及钝化层的质量会影响器件的表面复合速度,从而造成大电流下直流增益的显著下降。

关 键 词:温度特性  BJT  碳化硅  小时  表面复合速度  电流增益  共发射极  集电极电流
收稿时间:5/24/2010 3:51:42 PM
修稿时间:6/29/2010 3:19:42 PM

High temperature characterization of double base epilayer 4H-SiC BJTs
Zhang Qian,Zhang Yuming,Zhang Yimen and Wang Yuehu.High temperature characterization of double base epilayer 4H-SiC BJTs[J].Chinese Journal of Semiconductors,2010,31(11):114005-5.
Authors:Zhang Qian  Zhang Yuming  Zhang Yimen and Wang Yuehu
Affiliation:Key Laboratory of Semiconductor Wide Band-Gap Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory of Semiconductor Wide Band-Gap Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory of Semiconductor Wide Band-Gap Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory of Semiconductor Wide Band-Gap Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
Abstract:Based on the material characteristics and the operational principle of the double base epilayer BJTs, and according to the drift--diffusion and the carrier recombination theory, the common emitter current gain is calculated considering four recombination processes. Then its performance is analyzed under high temperature conditions. The results show that the emitter injection efficiency decreases due to an increase in the base ionization rate with increasing temperature. Meanwhile, the SiC/SiO2 interface states and the quality of the passivation layer will affect the surface recombination velocity, and make an obvious current gain fall-off at a high collector current.
Keywords:4H-SiC    Bipolar Junction Transistors(BJTs)    current gain    carrier recombination    high temperature
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