| 不同光刻胶有效曝光量的探讨 |
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| 引用本文： | 张洪波,张启生.不同光刻胶有效曝光量的探讨[J].徐州建筑职业技术学院学报,2011,11(1):37-39,50. |
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| 作者姓名： | 张洪波 张启生 |
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| 作者单位： | 1. 徐州建筑职业技术学院,教务处,江苏,徐州,221116
2. 徐州工程机械股份有限公司,技术部,江苏,徐州,221006 |
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| 基金项目： | 2010年校级科研课题 |
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| 摘 要： | 对瑞红胶及Shipley胶制作光栅掩模时的有效曝光量进行了实验.结果表明瑞红胶全息曝光对应的感光效率只是单束光曝光感光效率的0.65倍,Shipley胶全息曝光对应的感光效率只是单束光曝光感光效率的0.8倍;且同种光刻胶的光栅掩模在不同空频的有效曝光量亦不同,即光刻胶的有效曝光量与感光效率及光栅掩模所在的空频有关.
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| 关 键 词： | Shipley光刻胶 瑞红光刻胶 光栅掩模 有效曝光量 |
Research on Effective Exposures of Different Photo Resists |
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| ZHANG Hong-bo,ZHANG Qi-sheng.Research on Effective Exposures of Different Photo Resists[J].Journal of XUZHOU Institute of Architectural Technology,2011,11(1):37-39,50. |
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| Authors: | ZHANG Hong-bo ZHANG Qi-sheng |
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| Affiliation: | ZHANG Hong-bo1,ZHANG Qi-sheng2(1.Office of Teaching Affairs,Xuzhou Institute of Architectural Technology,Xuzhou,Jiangsu 221116,China,2.Technical Section,Xuzhou Engineering Machinery Co.Ltd.,Jiangsu 221006,China) |
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| Abstract: | This paper carried out tests on the effective exposures of Ruihong and shipley photo resists used in making the raster masking.The results showed that the photosensitive efficiency of Ruihong photoresist holographic exposure is 0.65 and of shipley 0.8 times that of single-beam exposure;the raster masking effective exposures of the same-type photoresists on different space-frequencies quite differed,i.e.,the effctive exposure of photoresist related directly to its photosensitive efficiency and the space-freq... |
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| Keywords: | Ruihong photo resist raster masking effective exposure |
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