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| 溅射沉积AlN薄膜结构与基片种类的关系 | |
| 引用本文： | 许小红,武海顺,张聪杰,金志浩.溅射沉积AlN薄膜结构与基片种类的关系[J].压电与声光,2000,22(4):256-258. |
| 作者姓名： | 许小红 武海顺 张聪杰 金志浩 |
| 作者单位： | 1. 西安交通大学,材料学院,西安,710049;山西师范大学,化学系,临汾,041004 2. 山西师范大学,化学系,临汾,041004 3. 西安交通大学,材料学院,西安,710049 |
| 基金项目： | 国家自然科学基金!（29741004），山西省自然科学基金联合资助项目 |
| 摘 要： | 采用高真空直流磁控反应溅射成功地在５种基片上制备出多晶择优取向的ＡＩＮ薄膜。结果表明，５种基片均可生长（１００）面掺优取向的ＡＩＮ薄膜，并且具有良好的纵向组成均匀性，表面粗造度小，晶粒均匀致密。在金属电极和Ｓｉ片上沉积的ＡＩＮ薄膜结晶度、取向性、衍射强度差别较小，两者的结构均优于在盖玻片上的沉积的ＡＩＮ薄膜。 |
| 关 键 词： | AIN薄膜 基片 磁控反应溅射 |
| 修稿时间： | 2000-01-07 |
Studies on the Effects of the Different Substrates on the Structures of AlN Thin Films |
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| XU Xiao-hong,WU Hai-shun,ZHANG Cong-jie,JIN Zhi-hao.Studies on the Effects of the Different Substrates on the Structures of AlN Thin Films[J].Piezoelectrics & Acoustooptics,2000,22(4):256-258. | |
| Authors: | XU Xiao-hong WU Hai-shun ZHANG Cong-jie JIN Zhi-hao |
| Abstract: | Aluminum nitride thin films w ith（100）orientation have been successful ly deposited on five kinds of substrates using DC reactive magnetron sputtering．T he films have been characterized by X-ra y diffraction，Auger electron spectrosco ps（AES）and atomic force microscope（AFM）． The results show that these AlN thin fil ms were homogeneous in vertical section， very low roughness for their surface，and had a preferr ed orientation with（100）．The diffraction i ntensity of preferred orientation for Al N films deposited on Si substrates and A l／Si（Al／glass）substrates were generally better than that of on glass． |
| Keywords: | aluminum ni tride thin films substrates structure magnetron reactive sputtering |
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