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AlGaAs:Si中与DX中心有关的光生电子陷阱特性研究(英文)
引用本文:贾英波,李名复,周洁,高季林,孔梅影.AlGaAs:Si中与DX中心有关的光生电子陷阱特性研究(英文)[J].固体电子学研究与进展,1989(4).
作者姓名:贾英波  李名复  周洁  高季林  孔梅影
作者单位:中国科学院研究生院 (贾英波,李名复),中国科学院半导体研究所 (周洁,高季林),中国科学院半导体研究所(孔梅影)
摘    要:


Characteristics of Photo-Induced Electron Trap State Related to DX Centers in AIGaAs:Si
Abstract:A new electron trap state SD was found by DLTS measurement under light illumination in Si doped A.lxGa1-xAs. This new trap energy level ESD is shallower than the DX center energy in the gap and the concentration of SD is comparable to that of DX centers. The emission activation energy Ec=0.20±0.05eV and capture activation energy Ec= 0.17±0.05eV. The SD DLTS peak has never been detected previously because under dark and thermal equilibrium condition most of the electrons occupy the deeper DX states and most of SD states are empty. However, when the sample is illuminated by light, electrons are excited to the conduction band and then re-captured by SD since the deeper DX states have a slower electron capture rate, thus a new DLTS peak corresponding to SD appears. Constant temperature capacitance transient C-t and transient C-V measurements were also used to further confirm the existence of SD states.
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