Tribological Characteristics of Si3N4 Ceramic in High-Temperature and High-Pressure Water

The effects of sliding speed and dissolved oxygen on the tribological behavior of Si₃N₄ sliding on itself in water were investigated at room temperature and at 120°C saturated vapor pressure. The friction coefficients and specific wear rates at 120°C were much larger than those at room temperature and had a minimum at about 0.4 m/s, whereats -the specific wear rate of the disk increased with increasing the sliding speed. The wear rate at lower sliding speeds in water at 120°C is considered to be primarily controlled by the increase of the contact stress on the asperities which are formed by the dissolution of grain boundaries of the Si₃N₄ ceramic and the subsequent dissolution of the silica layer of the reaction product However, the wear rate at higher sliding speeds is governed by the direct oxidation and microfracture of the Si₃N₄ substrate. The tribochemical reaction to produce NH₃ mainly occurred at all sliding conditions in water at room temperature and 120°C, and the reaction to produce H₂ gas appeared slightly only at the sliding speeds above 0.4 m/s at 120°C. The tribological behavior was independent of dissolved oxygen concentration for all sliding conditions in water at room temperature and 120°C.