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结构片断法计算离子型表面活性剂的HLB值
引用本文:杨运泉,李远喜,童刚生,李国龙. 结构片断法计算离子型表面活性剂的HLB值[J]. 精细化工, 2008, 25(5): 449-453
作者姓名:杨运泉  李远喜  童刚生  李国龙
作者单位:湘潭大学,化工学院,湖南,湘潭,411105;湘潭大学,化工学院,湖南,湘潭,411105;湘潭大学,化工学院,湖南,湘潭,411105;湘潭大学,化工学院,湖南,湘潭,411105
摘    要:运用结构片断法计算离子型表面活性剂的疏水值logP,并将疏水值概念引入Davies基团贡献法以代替该模型中亲油基的基团数,从而建立了计算离子型表面活性剂HLB值的新模型为:HLB=7+∑亲水基基团数-∑疏水基logP。通过与文献列举的17个不同系列离子型表面活性剂的HLB值对照表明,该新模型的计算值与文献值的平均相对偏差为1.68%。采用非线性方法拟合了烷基硫酸钠,烷基磺酸钠和烷基三甲基溴化铵3类典型离子型表面活性剂的CMC和HLB的关系,并得到了其关联方程,拟合结果表明,由新模型得到的关联方程其复相关系数R2>0.988。

关 键 词:离子型表面活性剂  HLB值  CMC  结构片断法  疏水值logP  基团贡献法
文章编号:1003-5214(2008)05-0449-05
修稿时间:2007-12-13

Simulation of HLB Value for Ion-surfactants by Configuration-fragment Method
YANG Yun-quan,LI Yuan-xi,TONG Gang-sheng,LI Guo-long. Simulation of HLB Value for Ion-surfactants by Configuration-fragment Method[J]. Fine Chemicals, 2008, 25(5): 449-453
Authors:YANG Yun-quan  LI Yuan-xi  TONG Gang-sheng  LI Guo-long
Abstract:Hydrophobe value logP was calculated by configuration-fragment method and the conception of logP was introduced into the Davies' group contribution equation to replace the lipophilic group value.A new model was built up to calculate the HLB values of ion-surfactants.By the comparison of the HLB values of 17 ion-surfactants of different series cited from literatures,the average relative deviation between the calculated values by the new model and the published data was obtained as 1.68%.Meanwhile,by non-linear correlation,the relationship between CMC and HLB of the typical three ion-surfactants,sodium alkyl sulfates,sodium alkylsulfonates and alky ltrimethyl ammonium bromides,was correlated.The results indicate that the correlation equations obtained by the new model have a high correlation coefficient of R2>0.988.
Keywords:ion-surfactant  hydrophile-lipophile balance(HLB)  critical micelle concentration(CMC)  configuration-fragment method  hydrophobe value(logP)  group contribution method
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