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Sb对直流反应磁控溅射制备TiO2薄膜的影响
引用本文:沃松涛,沈杰,蔡臻炜,崔晓莉,张群,杨锡良,章壮健. Sb对直流反应磁控溅射制备TiO2薄膜的影响[J]. 真空科学与技术学报, 2004, 24(3): 182-186
作者姓名:沃松涛  沈杰  蔡臻炜  崔晓莉  张群  杨锡良  章壮健
作者单位:复旦大学材料科学系,上海,200433
摘    要:用直流磁控溅射方法在Si(100)面及载玻片上制备了Sb掺杂TiO2薄膜.利用XRD光谱研究了Sb对其薄膜结晶情况的影响,用AFM观察其表面形貌,利用分光光度计测量了TiO2薄膜的光学特性及其对亚甲基蓝的分解活性,通过测量和计算表面对水的接触角来衡量光致亲水性.研究结果表明纯TiO2薄膜为锐钛矿型,适量Sb的掺杂能使TiO2薄膜的结晶有显著改善,并出现Ti2O3和金红石相TiO2,薄膜的光催化活性和光致亲水性明显改善.随着掺杂量的增加,TiO2薄膜的吸收边逐渐红移.但Sb掺杂过量时,破坏了二氧化钛原有的晶格结构,光催化活性和光致亲水性也相应降低.

关 键 词:二氧化钛  直流磁控溅射    红移
文章编号:1672-7126(2004)03-0182-05
修稿时间:2003-09-15

Influence of Sb on TiO2 Thin Films Grown by DC Reactive Magnetron Sputtering
Wo Songtao,Shen Jie,Cai Zhenwei,Cui Xiaoli,Zhang Qun,Yang Xiliang and Zhang Zhuangjian. Influence of Sb on TiO2 Thin Films Grown by DC Reactive Magnetron Sputtering[J]. JOurnal of Vacuum Science and Technology, 2004, 24(3): 182-186
Authors:Wo Songtao  Shen Jie  Cai Zhenwei  Cui Xiaoli  Zhang Qun  Yang Xiliang  Zhang Zhuangjian
Affiliation:Wo Songtao,Shen Jie,Cai Zhenwei,Cui Xiaoli,Zhang Qun,Yang Xiliang and Zhang Zhuangjian *
Abstract:Sb doped TiO 2 thin films were prepared on Si(100) wafers and microscope glass slides by DC reactive magnetron sputtering.The Sb concentration was controlled by adjusting the doping time.XRD patterns were used to study the influence of Sb on film crystallite and AFM to investigate their surface morphology.The optical transmission of the films and the degradation of methylene blue were measured by spectrophotometer.The hydrophilicity was avaluated by measuring water contact angle.We found that appropriate Sb doping is beneficial to crystallite and photo induced characteristic as well.Ti 2O 3 and TiO 2 in rutile phase are showed in XRD patterns.The adsorption edges of Sb doped films show a red shift.Overdoping of Sb is detrimental to the film crystallization and the film exhibits worse photocatalicity and hydrophilicity.
Keywords:TiO 2  DC magnetron sputtering  Sb  Red shift
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