Aktive Thermosonde zur Messung des Energieeinstromes

A active thermal probe for the measurement of the energy influx A continuously working active thermal probe for the determination of the energy influx at plasma‐technological processes is presented. The principle of mesurement is based on the compensation of the incoming energy influx. Key benefits are the application for continuous measurement and the suitability for thin film deposition. A calibration is not needed. At selected positions of the reactor the energy influx to the probe can be measured and the correlation with properties of the growing layer or the treated surface, respectively, can be determined. Since the thermal probe reacts sensitively to the process parameters at the substrate surface it is very well qualified for control and monitoring of layer growth or surface treatment processes. The probe is a ost‐efficient, particularly suitable device for quality control in plasma‐technological applications.