Room temperature deposited vanadium oxide thin films for uncooled infrared detectors |
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Authors: | RTRajendra KumarB Karunagaran D Mangalaraj SaK NarayandassP Manoravi M JosephVishnu Gopal RK MadariaJP Singh |
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Affiliation: | a Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641046, India b Materials Chemistry Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603102, India c Solid State Physics Laboratory, Lucknow Road, New Delhi 110054, India |
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Abstract: | We demonstrate the room temperature deposition of vanadium oxide thin films by pulsed laser deposition (PLD) technique for application as the thermal sensing layer in uncooled infrared (IR) detectors. The films exhibit temperature coefficient of resistance (TCR) of 2.8%/K implies promising application in uncooled IR detectors. A 2-D array of 10-element test microbolometer is fabricated without thermal isolation structure. The IR response of the microbolometer is measured in the spectral range 8-13 μm. The detectivity and the responsivity are determined as ∼6×105 cm Hz1/2/W and 36 V/W, respectively, at 10 Hz of the chopper frequency with 50 μA bias current for a thermal conductance G∼10-3 W/K between the thermal sensing layer and the substrate. By extrapolating with the data of a typical thermally isolated microbolometer (G∼10−7 W/K), the projected responsivity is found to be around 104 V/W, which well compares with the reported values. |
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Keywords: | A Thin films |
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