Device and material properties of pseudomorphic HEMT structuressubjected to rapid thermal annealing

The device-related effects of rapid thermal annealing (RTA) on the electrical and optical properties of planar-doped AlGaAs/InGaAs/GaAs high-electron-mobility transistor structures grown by molecular beam epitaxy were investigated. Specifically, electrical and optical characterization techniques such as capacitance versus voltage, current versus voltage, Hall effect, and photoluminescence have been applied to study the effects that typical III-V compound semiconductor rapid thermal processes (RTPs) have on the properties of pseudomorphic AlGaAs/InGaAs/GaAs structures for two different values of In mole fraction content. The effect and stability of the indium mole fraction on both heterostructure and device integrity with respect to RTA schedule has been investigated in detail