|
|||||
|
|
| 离子束刻蚀工艺误差对DOE器件的影响 | |
| 引用本文： | 刘强,张晓波,邬融,田杨超,李永平.离子束刻蚀工艺误差对DOE器件的影响[J].光电工程,2007,34(11):50-54,60. |
| 作者姓名： | 刘强 张晓波 邬融 田杨超 李永平 |
| 作者单位： | 1. 中国科学技术大学,物理系,安徽,合肥,230026 2. 中国科学技术大学,国家同步辐射实验室,安徽,合肥,230027 3. 中国科学技术大学,物理系,安徽,合肥,230026;中国科学院量子信息重点实验室,安徽,合肥,230026 |
| 基金项目： | 国家高技术研究发展计划(863计划) |
| 摘 要： | 针对衍射光学元件(DOE)的离子束刻蚀工艺,结合掩模套刻过程实例,本文提出了刻蚀误差面形分布的概念.在标量衍射的夫琅和费原理上,进行了误差数值模拟分析及讨论.模拟分析和实验数据结果表明,误差的面形分布在DOE器件的衍射焦斑中心会产生一个明显的光强畸变毛刺亮点,严重破坏了靶场照明的均匀性. |
| 关 键 词： | 衍射光学元件 误差面形 掩模套刻 离子束刻蚀 |
| 文章编号： | 1003-501X（2007）11-0050-05 |
| 收稿时间： | 2007/1/20 |
| 修稿时间： | 2007-01-202007-08-20 |
Influence of fabrication error in ion beam etching on diffractive optical element |
|
| LIU Qiang,ZHANG Xiao-bo,WU Rong,TIAN Yang-chao,LI Yong-ping.Influence of fabrication error in ion beam etching on diffractive optical element[J].Opto-Electronic Engineering,2007,34(11):50-54,60. | |
| Authors: | LIU Qiang ZHANG Xiao-bo WU Rong TIAN Yang-chao LI Yong-ping |
| Abstract: | According to the technical process of ion beam etching on Diffractive Optical Element (DOE), a distribution of surface error in ion beam etching was presented. The analysis of numerical simulation based on the theory of Fraunhofer of scalar diffraction was discussed. The results of analysis and experiment show that the surface distribution of etching error causes an aberrant spot of intensity obviously in the center of focal area of DOE, which consumedly reduces the uniformity of target field in uniform illumination. |
| Keywords: | diffractive optical element surface error mask etching ion beam etching |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |