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Morphological,Mechanical Property Analysis and Comparative Study over Structural Properties of CVD TiN Film Grown under Different Substrate Temperature in Nitrogen Gas Atmosphere |
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| Authors: | Das Soham Guha Spandan Ghadai Ranjan Sharma Ashis Chatterjee Saikat |
| Affiliation: | 1.Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Majitar, Rangpo-East Sikkim, 737136, India ;2.School of Mechanical Engineering, KIIT University, Bhubaneswar, Odisha, 751024, India ; |
| Abstract: | Silicon - Titanium Nitride (TiN) thin films were deposited by thermal chemical vapor deposition process (CVD) over Si (100) substrate under different substrate temperatures. Morphological,... |
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