| 基于保角变换的片内互连线电容二维解析模型 |
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| 引用本文： | 王颀,屠睿,邵丙铣.基于保角变换的片内互连线电容二维解析模型[J].计算机辅助设计与图形学学报,2005,17(12):2676-2684. |
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| 作者姓名： | 王颀 屠睿 邵丙铣 |
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| 作者单位： | 复旦大学国家微电子材料与元器件微分析中心,上海,200433;复旦大学国家微电子材料与元器件微分析中心,上海,200433;复旦大学国家微电子材料与元器件微分析中心,上海,200433 |
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| 摘 要： | 通过保角变换严格推导了计入交叠电场贡献的有用电容元的解析表达式,在此基础上提出的互连线二维解析模型能够在一定的连线截面几何参数范围内取得精确的提取结果.实验证明,对于双线系统和多线系统,文中推导的解析模型的提取误差的均方值分别小于2%和7%,均优于对比文献的提取精度.作为一种有竞争力的电容提取方法,该解析模型能够应用于互连线分析设计工具软件之中.
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| 关 键 词： | 二维互连线分析 电容提取 保角变换 |
| 收稿时间： | 2004-10-18 |
| 修稿时间： | 2004-10-182005-02-25 |
2D Analytical Model for On-Chip Interconnect Capacitance Extraction Based on Conformal Mapping Method |
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| Wang Qi,Tu Rui,Shao Bingxian.2D Analytical Model for On-Chip Interconnect Capacitance Extraction Based on Conformal Mapping Method[J].Journal of Computer-Aided Design & Computer Graphics,2005,17(12):2676-2684. |
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| Authors: | Wang Qi Tu Rui Shao Bingxian |
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| Affiliation: | National Micro-analysis Center of Microelectronics Materials and Componentsl Devices, Fudan University, Shanghai 200433 |
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| Abstract: | Based on the conformal mapping method, we rigorously derive analytical expressions for useful elementary capacitances, including the contributions of superposition electric fields, upon which an accurate 2D analytical model of interconnect capacitance is established within certain parameter ranges of cross section geometries of interconnect lines. It is verified through simulation that the mean square errors of analytical models for double-line system and multi-line system are less than 2 % and 7 % respectively. The proposed expressions excel other referenced expressions in capacitance extraction accuracy, being able to act as a competitive capacitance extraction method embedded in interconnect analysis and design tools. |
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| Keywords: | 2D interconnect analysis capacitance extraction conformal mapping |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
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