| 缩小投影电子束曝光机的调试技术 |
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| 引用本文： | 彭开武,张福安,顾文琪. 缩小投影电子束曝光机的调试技术[J]. 微细加工技术, 2002, 0(4): 21-25 |
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| 作者姓名： | 彭开武 张福安 顾文琪 |
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| 作者单位： | 中科院电工所,北京,100080 |
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| 摘 要： | 详细介绍了在透射电镜上进行缩小投影电子束曝光技术原理性实验的主要调试过程。它充分利用了透射电镜本身的功能与特点。整个调试方法不仅可获得高分辨率图形，而且为下一步的研究工作提供了比较好的工作参数。
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| 关 键 词： | 投影 电子束曝光机 调试技术 透射电镜 TEM 改造 |
| 文章编号： | 1003-8213(2002)04-0021-05 |
| 修稿时间： | 2002-08-19 |
Technology of Adjusting the Projection Electron-beam Lithography with Demagnification Imaging |
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| PENG Kai wu,ZHANG Fu an,GU Wen qi. Technology of Adjusting the Projection Electron-beam Lithography with Demagnification Imaging[J]. Microfabrication Technology, 2002, 0(4): 21-25 |
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| Authors: | PENG Kai wu ZHANG Fu an GU Wen qi |
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| Abstract: | The main adjusting procedure of the projection electron beam lithography with demagnification imaging on a transmission electron microscope(TEM) is introduced in detail. We make fully use of the function and performance of the TEM to obtain the high resolution pattern and get the available parameters for the further experiment. |
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| Keywords: | projection electron beam lithography adjusting transmission electron microscope |
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