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A theoretical model on pore size distribution in low dielectric constant nanoporous silica films |
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| Authors: | Jyh-Ping Hsu Shih-Hsing Hung Wen-Chang Chen |
| Affiliation: | Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan |
| Abstract: | |
| Keywords: | Dielectrics Growth mechanism Nanoporous silica film Pore size distribution |
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