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Preparation and Characterization of Highly Oriented ZnO Film by Ultrasonic Assisted SILAR Method
引用本文:GAO Xiangdong LI Xiaomin YU Weidong. Preparation and Characterization of Highly Oriented ZnO Film by Ultrasonic Assisted SILAR Method[J]. 武汉理工大学学报(材料科学英文版), 2005, 20(3): 23-26. DOI: 10.1007/BF02835019
作者姓名:GAO Xiangdong LI Xiaomin YU Weidong
作者单位:[1]State Key Laboratory of High Performance Ceramics and Superf'me Microstructures, Shanghai Institute of Ceramics of Chinese Academy of Sciences, Shanghai 200050, China
基金项目:Financially supported by the Ministry of Science anti Technology of China through 973-Project ( No. 2002CB613306).
摘    要:Ultrasonic Assisted SILAR method (UA-SILAR) was developed and highly oriented ZnO films were deposited on the glass substrate by this novel technique. The crystallinity and microstructure of as-deposited ZnO films were analyzed by means of XRD and SEM. Moreover, the underling deposition mechanism of ZnO films was discussed. Results show that obtained ZnO films exhibit an excellent crystallinity with the preferentioal orientation of (002) plane. The crystalline grain of films is about 40nm in size,which is supported by both the Sherrer equation and the SEM result. However, the ZnO film is composed of numerous clustered purticulates in the size of 200 to 300nm, and each particulate is the compact aggregation of smaller ZnO crystalline grains. It is .speculated that the excellent crystallinity of ZnO films may chiefly originate from the cavatition effect of the ultrasonic rinsing process.

关 键 词:氧化锌薄膜 UA-SILAR 超音速 玻璃 微观结构
收稿时间:2004-10-21
修稿时间:2005-05-21

Preparation and characterization of highly oriented ZnO film by ultrasonic assisted SILAR method
Gao Xiangdong Ph D,Li Xiaomin,Yu Weidong. Preparation and characterization of highly oriented ZnO film by ultrasonic assisted SILAR method[J]. Journal of Wuhan University of Technology. Materials Science Edition, 2005, 20(3): 23-26. DOI: 10.1007/BF02835019
Authors:Gao Xiangdong Ph D  Li Xiaomin  Yu Weidong
Affiliation:(1) State Key Laboratory of High Performance Ceramics and Superfine Microstructures, Shanghai Institute of Ceramics of Chinese Academy of Sciences, 200050 Shanghai, China
Abstract:Ultrasonic Assisted SILAR method (UA-SILAR) was developed and highly oriented ZnO films were deposited on the glass substrate by this novel technique. The crystallinity and microstructure of as-deposited ZnO films were analyzed by means of XRD and SEM. Moreover, the underling deposition mechanism of ZnO films was discussed. Results show that obtained ZnO films exhibit an excellent crystallinity with the preferential orientation of (002) plane. The crystalline grain of films is about 40nm in size, which is supported by both the Sherrer equation and the SEM result. However, the ZnO film is composed of numerous clustered particulates in the size of 200 to 300nm, and each particulate is the compact aggregation of smaller ZnO crystalline grains. It is speculated that the excellent crystallinity of ZnO films may chiefly originate from the cavatition effect of the ultrasonic rinsing process.
Keywords:ZnO films    U4- SILAR    preparation
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