Effects of internal scattering on X-ray microtomography imagereconstruction |
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Authors: | Kalukin AR |
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Affiliation: | Center for Integrated Electron. & Electron. Manuf., Rensselaer Polytech. Inst., Troy, NY; |
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Abstract: | A computer simulation is used to study the problem of internal scattering for targets that are imaged using X-ray microtomography. A strategy is outlined for selecting X-ray energy and image resolution based on properties of the material being imaged. The X-ray scanning process is simulated by applying a Monte Carlo technique to a modeled target that emulates the material properties of a microelectronic device. The X-ray photons are subject to photoelectric absorption, Rayleigh scattering, and Compton scattering. The simulation applies a method of high-resolution image reconstruction based on discrete Fourier transforms. Examples of reconstructed images that have 0.5-μm spatial resolution are shown for images of simulated lead and aluminum targets |
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