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Selective silicon epitaxial growth by LPCVD using silane |
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| Authors: | Parker G.J. Starbuck C.M.K. |
| Affiliation: | Dept. of Electron. & Comput. Sci., Southampton Univ., UK; |
| Abstract: | Chlorine chemistry can have adverse effects on LPCVD systems and components. Results demonstrating the growth of selective silicon epitaxial layers in excess of 0.7 mu m thickness showing excellent uniformity and selectivity without the use of HCl are presented.< |
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