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The effects of applied current density,bath concentration and temperature on the morphology,crystal structure and photoelectrochemical properties of electrodeposited hematite films
Affiliation:1. State Key Laboratory of Inorganic Synthesis and Preparative Chemistry, College of Chemistry, Jilin University, Changchun, 130012, PR China;2. Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen, 518055, PR China;1. Biological Processes Laboratory (LPB), São Carlos School of Engineering (EESC), University of São Paulo (USP), 1100, João Dagnone Avenue, São Carlos, São Paulo, Brazil;2. Microbial Ecology Laboratory, Microbial Biochemistry and Genomics Department, Biological Research Institute “Clemente Estable”, 3318, Italia Avenue, Montevideo, Uruguay;1. Department of Materials Science and Engineering, Ibaraki University, 4-12-1 Nakanarusawa, Hitachi 316-8511, Japan;2. Research Reactor Institute, Kyoto University, 2-1010 Asashiro-nishi, Kumatori, Sennan, Osaka 590-0494, Japan;1. Graduate School of Natural Science and Technology, Kanazawa University, Kakuma, Kanazawa, Ishikawa 920-1192, Japan;2. Graduate Student of Natural Science and Technology, Kanazawa University, Kakuma, Kanazawa, Ishikawa 920-1192, Japan;3. Synchrotron Radiation Research Center, National Institutes for Quantum and Radiological Science and Technology, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan;1. Centro de Ciências Naturais e Humanas (CCNH), Universidade Federal do ABC (UFABC), 09210-170, Santo André, SP, Brazil;2. Department of Materials Science & Engineering and NEAT ORU, University of California, Davis, One Shields Avenue, Davis, CA, 95616, USA
Abstract:
Keywords:Hematite films  Electrodeposition  Crystal structure  Morphology  Photoactivity
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