Deposition of heterojunction of ZnO on hydrogenated TiO2 nanotube arrays by atomic layer deposition for enhanced photoelectrochemical water splitting |
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| Affiliation: | 1. Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, 804, Taiwan;2. Department of Materials Science and Engineering, Feng Chia University, Taichung, 407, Taiwan;1. Department of Physics, University of Kashan, Kashan, Islamic Republic of Iran;2. Institute of Nanoscience and Nanotechnology, University of Kashan, Kashan, Islamic Republic of Iran;1. Department of Alternative Energy Sources, Vocational School, Erzincan Binali Yıldırım University, 24100, Erzincan, Turkey;2. Department of Chemistry, Art & Science Faculty, Erzincan Binali Yıldırım University, 24100, Erzincan, Turkey;3. Department of Physics, Art & Science Faculty, Erzincan Binali Yıldırım University, 24100, Erzincan, Turkey;4. Institute of Science and Technology, Erzincan Binali Yıldırım University, 24100, Erzincan, Turkey;5. Nanotechnology and Nanomedicine Division, Institute of Science, Hacettepe University, 06800, Ankara, Turkey;1. Institute of Materials Science and Engineering, Ocean University of China, Qingdao 266100, China;2. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;3. Qingdao center of Resource Chemistry and New Materials, Qingdao 266100, China;1. School of Nano & Materials Science and Engineering, Kyungpook National University, 2559 Gyeongsang-daero, Sangju, Gyeongbuk, South Korea;2. Research Institute of Environmental Science & Technology, Kyungpook National University, 80 Daehak-ro, Buk-gu, Daegu, South Korea;3. Department of Energy Engineering, Gyeongnam National University of Science and Technology (GNTECH), Jinju, Gyeongnam, 52849, South Korea;1. NanoBioMedical Centre, Adam Mickiewicz University, 3 Wszechnicy Piastowskiej Str., 61-614, Poznan, Poland;2. Centre of Laser and Plasma Engineering, The Szewalski Institute of Fluid-Flow Machinery, Fiszera 14 Str., 80-231 Gdansk, Poland |
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| Abstract: | The heterojunction of ZnO was deposited on hydrogenated TiO2 nanotube arrays (H–TiO2) by atomic layer deposition (ALD) with various cycles. The ZnO was uniformly wrapped with the H–TiO2 samples and the thickness could be accurately controlled by the cycle numbers of ALD. The higher growth rate ~2.7 Å/cycle was obtained due to the surface amorphous layer, compared with the air-treated samples (A-TiO2), ~2.3 Å/cycle. When the cycle numbers increased to 200, nanowire arrays appeared. Interestingly, the absorption in the visible light region improved more significantly when ALD ZnO was employed for the H–TiO2 rather than the A-TiO2 samples. The H–TiO2 samples with 42 nm of ALD ZnO exhibited enhanced photoelectrochemical water splitting performances, compared with the A-TiO2 with 42 nm of ALD ZnO. This was related to the higher degree of the electronic band bending and improved photo-response in the UV and visible light region, resulting from the oxygen vacancies. |
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| Keywords: | Atomic layer deposition Photoelectrochemical water spitting |
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