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Local investigation of hot spot areas on multicrystalline silicon solar cells
Affiliation:1. Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstr. 2, 79110 Freiburg, Germany;2. Hennecke Systems GmbH, Aachener Straße 100,53909 Zülpich, Germany
Abstract:The formation mechanism and the electrical consequences of hot spots have been investigated in multicrystalline solar cells. The hot spots were revealed by means of an IR camera when the cells are reverse biased in the dark. The minority carrier diffusion length (Ln), the open-circuit photovoltage (Voc) and the short-circuit photocurrent (Jsc) were measured both in the hot spot area and far from this zone by masking off and etching small mesa diodes around suspect areas. Dark forward I–V curves were plotted in order to compute the values of ideality factor (M) and reverse saturation current (Jo).It is found that Jo and M are higher in the hot spot area, while Jsc, Voc and, to a less extent, Ln are smaller. Large densities of dislocations and lineages structures are revealed in the abnormally heated region by chemical etching of the samples. The dislocations involved in the hot spot formation could act as shunting paths for leakage currents, in addition to their contribution to recombination-generation currents.
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