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添加剂对钯电沉积层氢含量和内应力的影响
引用本文:杨防祖,许书楷.添加剂对钯电沉积层氢含量和内应力的影响[J].电镀与涂饰,1998,17(1):6-10.
作者姓名:杨防祖  许书楷
作者单位:厦门大学化学系!361005
摘    要:采用电化学方法研究了添加剂对钯电沉积层氯含量和应力的影响。结果表明,含有光亮剂的镀液中所获得的钯电沉积层氢含量较无添加剂的显著提高,表面活性剂可极大降低镀层氢含量。添加剂的协同作用使镀层应力状态发生变化;在电沉积初期,沉积层内应力变化较大,随后逐渐趋于稳定。

关 键 词:  电沉积层  氢含量  内应力  助剂  镀层  电镀

Effect of Additives on Hydrogen Content & Internal Stress of Palladium Electrodeposits
IANG Faggzu, XU Shukai, LI Zhenliang, ZHOU Shaomin.Effect of Additives on Hydrogen Content & Internal Stress of Palladium Electrodeposits[J].Electroplating & Finishing,1998,17(1):6-10.
Authors:IANG Faggzu  XU Shukai  LI Zhenliang  ZHOU Shaomin
Affiliation:IANG Faggzu; XU Shukai; LI Zhenliang; ZHOU Shaomin
Abstract:The effect of additives on hydrogen content and internal stress of palladiumelectrodeposits was studied by electrochemical method. The results show that hydrogen contentof the obtained palladium electrodeposits from the bath with brighteners is obviously higherthan that without additives, and will be remarkably decreased in the bath with surfactant.Thesynergistic action of the additives may cause the electrodeposits to show in tensile orcompression stress. The internal stress of the deposits was quite changable at the beginningof the electrodeposition and gradually turned to be stable later on.
Keywords:palladium  electrodeposition  hydrogen content  stress  additive
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