TFET on Selective Buried Oxide (SELBOX) Substrate with Improved ION/IOFF Ratio and Reduced Ambipolar Current |
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| Authors: | Barah Dhruvajyoti Singh Ashish Kumar Bhowmick Brinda |
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| Affiliation: | 1.Department of Electronics and Communication Engineering, National Institute of Technology, Silchar, 788010, Assam, India
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| Abstract: | Silicon - This paper proposes a new structure for tunnel field effect transistor on a selective buried oxide (SELBOX) substrate. An extensive simulation study and a comparative performance analysis... |
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