Structural investigation of bulk and thin film PLZT using X-ray absorption spectroscopy

Thin film electro-optic and non-linear optical materials are of interest for applications in high-speed integrated optical devices. Materials of the system Pb_1?x/100La_x/100(Zr_y/100 Ti_1?y/100)_1?x/400O₃ or PLZT x/y/(100?y) are attractive since they can be integrated into Si and GaAs substrates using suitable deposition techniques. In this investigation we examine the structural properties of r.f. magnetron sputter-deposited PLZT using X-ray absorption near-edge spectroscopy (XANES). For XANES analysis, four samples were selected: (1) a highly oriented PLZT 28/0/100 film of ≈ 4500 Å deposited on SiO₂; (2) a highly oriented PLZT 28/0/100 film of ≈ 4500 Å deposited on a 2 ωm SiO₂ buffer layer over a Si(100) substrate; (3) a highly oriented PLZT 28/0/100 film of ≈4500 Å deposited on Al₂O₃ (1 02); and (4) a commercial ceramic wafer of PLZT 9/65/35. The XANES experiments were performed at the Stanford Synchrotron Radiation Laboratory (SSRL) using electron yield and fluorescence techniques. Data was taken at the Ti K-edge (4966.4eV) and compared to reference spectra. Of the reference spectra, the Ti K-edge spectra of the PLZT most closely resemble perovskite (SrTiO₃). The surface and bulk thin film are similar and all the 28/0/100 spectra resemble the spectra of 9/65/35, indicating similar cubic perovskite structures for these materials.