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等离子体化学气相沉积类金刚石碳膜的特性及应用
引用本文:蔺增,巴德纯,杨乃恒. 等离子体化学气相沉积类金刚石碳膜的特性及应用[J]. 真空, 2006, 43(3): 14-17
作者姓名:蔺增  巴德纯  杨乃恒
作者单位:东北大学真空与流体工程中心,辽宁,沈阳,110004
摘    要:类金刚石(DLC)膜是含有sp^3杂化态的亚稳态非晶碳膜,是具有极高的硬度、化学稳定性和光学透明性的半导体材料。这篇综述介绍了用等离子体化学气相沉积DLC膜的沉积方法、所制备薄膜的特性及应用,最后展望了DLC膜的发展趋势。

关 键 词:类金刚石碳膜  等离子体化学气相沉积  特性  应用
文章编号:1002-0322(2006)03-0014-04
收稿时间:2005-09-23
修稿时间:2005-09-23

Characteristics and application of diamond-like carbon films by PECVD
LIN Zeng,BA De-chun,YANG Nai-heng. Characteristics and application of diamond-like carbon films by PECVD[J]. Vacuum(China), 2006, 43(3): 14-17
Authors:LIN Zeng  BA De-chun  YANG Nai-heng
Affiliation:Vacuum and Fluid Engineering Research Center, Northeastern University, Shenyang 110004, China
Abstract:Diamond-like carbon(DLC) is an amorphous carbon in metastable state with significant sp~3 bond.As a semiconductor,it has a high hardness,chemical inertia and optical transparency.Reviews and introduces the deposition process,properties and some applications of DLC films by PECVD.
Keywords:diamond-like carbon  plasma enhanced chemical vapor deposition(PECVD)  properties  applications
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