(1) Institute of Micro/Nanometer Science and Technology, Shanghai Jiaotong University, 200030 Shanghai, P.R. China;(2) Department of Mechnical-Electronic, Tohoku University, 980-7985, Japan
Abstract:
The fabrication technique of highly ordered anodic porous alumina membrane by anodization of Al and the obtained membrane as a mask to the fabrication of 100 nm period antireflection grating hole are described. The two-step anodizing process improves the quality of the nanohole because the periodic seeds are generated by the first anodization. Antireflection grating structures are fabricated by using ordered anodic porous alumina mask and etched by SF6 fast atom beam on silicon wafer. The reflectivity of the antireflection grating structures is measured and compared with that of the calculated value and the polished silicon surface.A part of this work was performed in Venture Business Laboratory in Tohoku University, Japan.
