| 氮气反应溅射制备Co/Sb多层膜研究 |
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| 引用本文： | 岳帅鹏,朱京涛,涂昱淳,张一志.氮气反应溅射制备Co/Sb多层膜研究[J].光学仪器,2014,36(4):359-363. |
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| 作者姓名： | 岳帅鹏 朱京涛 涂昱淳 张一志 |
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| 作者单位： | 同济大学物理科学与工程学院 精密光学工程技术研究所,上海,200092 |
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| 基金项目： | 国家自然科学基金（11375131、11305104） |
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| 摘 要： | 针对"水窗"波段(280~540eV)对多层膜反射镜的应用需求,在Sb的M5吸收边(525.5eV)附近,选择Co和Sb作为该能点的多层膜材料组合,优化设计膜系结构。采用直流磁控溅射方法制备了Co/Sb多层膜,通过在溅射气体氩气中引入氮气作为反应气体,多层膜界面粗糙度明显减小。利用X射线掠入射反射(GIXRR)测试多层膜结构,并在北京BSRF同步辐射3W1B实验站测量了反应溅射前后的多层膜反射率(SXR),结果表明:氮气含量为25%时的界面粗糙度最小,反射率从无反应溅射的7.2%提高到11.7%。
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| 关 键 词： | 反应溅射 多层膜 同步辐射 Co/Sb |
| 收稿时间： | 2014/3/14 |
The research on Co/Sb multilayer in the nitrogen reactive sputtering |
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| YUE Shuaipeng,ZHU Jingtao,TU Yuchun and ZHANG Yizhi.The research on Co/Sb multilayer in the nitrogen reactive sputtering[J].Optical Instruments,2014,36(4):359-363. |
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| Authors: | YUE Shuaipeng ZHU Jingtao TU Yuchun and ZHANG Yizhi |
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| Affiliation: | Institute of Precision and Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;Institute of Precision and Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;Institute of Precision and Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;Institute of Precision and Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China |
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| Abstract: | In order to understand the application of the "water window" energy region between 280 eV and 540 eV, we have studied the design and fabrication of multilayer films at the M5-absorption edge of Sb (525.5 eV). Co and Sb were chosen to make up the multilayer films. Firstly, we optimized the multilayer film structure. Secondly, Co/Sb multilayer films were deposited on Si substrate by the DC magnetron sputtering method and the quality of these films were improved by using reactive sputtering in a nitrogen-argon gas mixture. Lastly, the multilayer film structure was measured by grazing incident x-ray reflection measurement(GIXRR)and the reflectivity was measured by soft x-ray reflectivity(SXR)at Beijing Synchrotron Light Source (BSRF). The results have shown that when the fraction of nitrogen was 25%, the interface roughness was the least of all. The reflectivity was improved from 7.2% to 11.7%. |
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| Keywords: | reactive sputtering multilayer synchrotron radiation Co/Sb |
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