Effect of thermal oxide on the crystallization of the anodic Ta2O5 film

SEM and TEM investigations of the crystallization process have been performed on amorphous Ta₂O₅ films grown by electrochemical oxidation of Ta foils. It was found that kinetics of crystallization and final structure of the anodic Ta₂O₅ film depend strongly on the thickness of the thermal oxide layer on the surface of the original Ta substrate. Two different modes of crystallization were detected for the substrate with native surface oxide and with the thermal oxide grown at elevated temperatures. Aborting of the crystallization was shown to be possible using short heating of the Ta₂O₅/Ta san dwiches which cuts crystalline inclusions grown into the amorphous matrix of the anodic Ta₂O₅ film from the Ta surface.