Process and device performance of 1 µm-channel n-well CMOS technology

The process and device performance of 1 µm-channel n-well CMOS have been characterized in terms of substrate resistivities of 40 and 10 Ω.cm, substrate materials with and without an epitaxial layer, n-well surface concentrations ranging from5 times 10^{15}to4 times 10^{16}cm^-3, n-well depths of 3, 4, and 5 µm, channel boron implantation doses from2 times 10^{11}to1.3 times 10^{12}cm^-2, and effective channel lengths down to 0.6 µm. The deeper n-well more effectively improved the short-channel effects in p-channel MOSFET's having lower n-well surface concentrations. The impact-ionization current of the 0.9 µm n-channel MOSFET started to increase at a drain voltage of 5.2 V, while that of the 0.6 µm p-channel MOSFET did not increase until the drain voltage exceeded 12 V. Minimum latchup trigger current was observed when the output terminal of an inverter was driven over the power supply voltage. This minimum latchup trigger current was improved about 25 to 35 percent by changing the n-well depth from 3 to 5 µm and was further improved about 35 to 75 percent by using a substrate resistivity of 10 Ω.cm instead of 40 Ω.cm. The epitaxial wafer with a substrate resistivity of 0.008 Ω.cm improved the minimum latchup trigger current by more than 40 mA. It was estimated from the inverter characteristics that the effective mobility ratio between surface electrons and holes is about 1.4 at effective channel lengths of 1.0 µm for p-channel MOSFET's and 1.4 µm for n-channel MOSFET's. The optimized 1 µm-channel n-well CMOS resulted in a propagation delay time of 200 ps with a power dissipation of 500 µW and attained a maximum clock frequency of 267 MHz in a static ÷ 4 counter. The deep-trench-isolated CMOS structure was demonstrated to break through the scaling effect drawback of n-well depth and surface concentration.