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Fabrication of microgratings on PMMA plate and curved surface by using copper mesh as X-ray lithography mask |
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| Authors: | Yigui Li Susumu Sugiyama |
| Affiliation: | (1) Research Organization of Science and Engineering, Ritsumeikan University, 525-8577 Kusatsu, Japan;(2) Institute of Micro-nano Science and Technology, Shanghai Jiaotong University, 200030 Shanghai, China;(3) Department of Micro System Technology, Ritsumeikan University, Kusatsu, Japan |
| Abstract: | We demonstrate experimentally the X-ray lithography technique to fabricate microgratings on a PMMA plate and on curved surfaces such as PMMA cylinder lens surfaces with X-ray lithography by copper mesh as mask. Some gratings with 12.7 μm pitches on the plate and on PMMA curved surface with large area (10 mm × 10 mm) by vertically moving or rotating the resist stage exposure are realized. |
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