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Field emission characteristics of fast grown nanocrystalline diamond/amorphous carbon composite films by microwave plasma-enhanced chemical deposition method |
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| Authors: | Wen-Jen Liu Xing-Jian Guo Cheng-Hsun Li |
| Affiliation: | a Department of Material Science and Engineering, I-Shou University, Kaohsiung, Taiwan, 840 ROC b High Voltage Electron Microscopy Station, National Institute for Materials Science (NIMS), 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan c Department of Materials Science and Engineering, MingDao University, Taiwan, ROC |
| Abstract: | This study synthesized the nanocrystalline diamond/amorphous carbon (NCD/a-C) composite films by the microwave plasma-enhanced chemical vapor deposition (MPCVD) system with Ar/CH4/N2 mixtures. A localized rectangular-type jet-electrode with high density plasma was used to enhance the formation of NCD/a-C films, and a maximum growth rate of 105.6 µm/h was achieved. The content variations of sp2 and sp3 phases via varying nitrogen gas flow rates were investigated by using Raman spectroscopy. The NCD/a-C film which synthesized with 6% nitrogen concentration and no hydrogen plasma etching treatment possessed a low turn-on electric field of 3.1 V/µm at the emission current of 0.01 µA. |
| Keywords: | Nanocrystalline diamond Diamond Chemical vapor deposition Nano-materials Field emission |
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