| Cu/X(X=Cr,Nb)纳米多层膜力/电学性能的尺度依赖性 |
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| 引用本文： | 张金钰,张欣,牛佳佳,刘刚,张国君,孙军. Cu/X(X=Cr,Nb)纳米多层膜力/电学性能的尺度依赖性[J]. 金属学报, 2011, 0(10) |
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| 作者姓名： | 张金钰 张欣 牛佳佳 刘刚 张国君 孙军 |
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| 作者单位： | 西安交通大学金属材料强度国家重点实验室; |
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| 基金项目： | 国家重点基础研究发展计划项目2010CB631003; 国家自然科学基金项目50971097资助~~ |
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| 摘 要： | 利用纳米压痕实验以及四探针法,系统研究了相同层厚Cu/X(X=Cr,Nb)纳米金属多层膜的力学性能(强/硬度)和电学性能(电阻率)的尺度依赖性.微观分析表明:Cu/X多层膜调制结构清晰,Cu层沿{111}面择优生长,X层沿{110}面择优生长.纳米压入结果表明,Cu/X多层膜的强度依赖于调制周期,并随调制周期的减小而增加.多层膜变形机制在临界调制周期(λ~c≈25 nm)由Cu层内单根位错滑移转变为位错切割界面.多层膜的电阻率不仅与表面/界面以及晶界散射相关,而且在小尺度下受界面条件显著影响.通过修正的FS-MS模型可以量化界面效应对多层膜电阻率的影响.Cu/X纳米多层膜可以通过调控微观结构实现强度-电导率的合理匹配.
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| 关 键 词： | Cu/Cr Cu/Nb 纳米多层膜 强度 电阻率 尺寸效应 |
LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X(X=Cr,Nb) NANOSTRUCTURED METALLIC MULTILAYERS |
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| ZHANG Jinyu,ZHANG Xin,NIU Jiajia,LIU Gang,ZHANG Guojun,SUN Jun State Key Laboratory for Mechanical Behavior of Materials,Xi'an Jiaotong University,Xi'an. LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X(X=Cr,Nb) NANOSTRUCTURED METALLIC MULTILAYERS[J]. Acta Metallurgica Sinica, 2011, 0(10) |
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| Authors: | ZHANG Jinyu ZHANG Xin NIU Jiajia LIU Gang ZHANG Guojun SUN Jun State Key Laboratory for Mechanical Behavior of Materials Xi'an Jiaotong University Xi'an |
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| Affiliation: | ZHANG Jinyu,ZHANG Xin,NIU Jiajia,LIU Gang,ZHANG Guojun,SUN Jun State Key Laboratory for Mechanical Behavior of Materials,Xi'an Jiaotong University,Xi'an 710049 |
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| Abstract: | By using nanoindentation test and four point probe method,the length scaled dependent mechanical property(hardness/strength) and electrical property(resistivity) of Cu/X(X=Cr, Nb) nanostructured metallic multilayers with equal individual layer thickness were systematically investigated. It is revealed from the microstructural analysis that the modulation structure of Cu/X metallic multilayers is clear,and the preferred growth planes of Cu layer and X layer are {111} and {110},respectively.The indentation te... |
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| Keywords: | Cu/Cr Cu/Nb nanostructured multilayer strength resistivity size effect |
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