Effect of barrier layers on the properties of indium tin oxide thin films on soda lime glass substrates |
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Authors: | Jung-Min Lee Byung-Hyun Choi Mi-Jung Ji Jung-Ho Park Jae-Hong Kwon |
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Affiliation: | a Electronic Materials Lab., Korea Institute of Ceramic ENG & TECH, Guemcheon-Gu Seoul, 233-5, Republic of Korea b Display and Nanosystem Lab., College of Engineering, Korea University, Seongbuk-Gu, Seoul, 136-701, Republic of Korea |
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Abstract: | In this paper, the electrical, structural and optical properties of indium tin oxide (ITO) films deposited on soda lime glass (SLG) haven been investigated, along with high strain point glass (HSPG) substrate, through radio frequency magnetron sputtering using a ceramic target (In2O3:SnO2, 90:10 wt.%). The ITO films deposited on the SLG show a high electrical resistivity and structural defects compared with those deposited on HSPG due to the Na ions from the SLG diffusing to the ITO film by annealing. However, these properties can be improved by intercalating a barrier layer of SiO2 or Al2O3 between the ITO film and the SLG substrate. SIMS analysis has confirmed that the barrier layer inhibits the Na ion's diffusion from the SLG. In particular, the ITO films deposited on the Al2O3 barrier layer, show better properties than those deposited on the SiO2 barrier layer. |
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Keywords: | Indium tin oxide (ITO) Soda lime glass (SLG) RF-magnetron sputtering Barrier layer Diffusion |
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