Characterization of copper oxide nanolayers deposited by direct current magnetron sputtering |
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Authors: | A.R. Rastkar A.R. Niknam B. Shokri |
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Affiliation: | Shahid Beheshti University, G.C., Laser-Plasma Research Institute, Tehran, 1983963113, Iran |
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Abstract: | Direct current reactive magnetron sputtering was used to deposit the thin layers of copper oxide (Cu2O) on glass substrates. A solid disc of pure copper as the target was sputtered in an argon gas under sputtering pressures varying from 0.133 to 4 Pa. The effects of the sputtering power and pressure on the structural and optical properties of Cu2O thin films were systematically studied. The deposited layers were characterized using X-ray diffraction, atomic force microscopy, profilometry and spectrophotometry. The optical transmission of the films was measured in the visible region. The increase in pressure resulted in a higher growth rate than increasing sputtering power. The increase in power produced Cu2O thin films that were detrimental to the optical transmission of the films. |
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Keywords: | Magnetron sputtering Absorption spectrometry Copper oxide X-ray diffraction |
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