Investigation of Nitrogen HXR with Neon Admixture on the APF Plasma Focus |
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| Authors: | A Roomi E Saion W Mahmood M Iqbal R Amrollahi M Habibi R Baghdadi G R Etaati |
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| Affiliation: | (1) Department of Physics, University Putra Malaysia, 43400 UPM Serdang, Selangor, Malaysia;(2) Department of Computer and Communication Systems Engineering, University Putra Malaysia, 43400 UPM Serdang, Selangor, Malaysia;(3) Department of Nuclear Engineering and Physics, Amirkabir University of Technology, Tehran, Iran |
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| Abstract: | An investigation on the HXR emitted from APF plasma focus device operated with different volumetric ratios of nitrogen-neon
(N2:Ne) admixture working gas at different voltage-pressure limits is presented. The optimum pressures obtained at the applied
voltages of 12, and 13 kV were 3.5 torr for percentage of (50:50) of (N2:Ne) admixture and 3 torr for percentages of (75:25) and (90:10) in admixture and also for pure N2, while at the voltage of 11 kV, the optimum pressures were 3 torr for percentage of (50:50) and 2.5 torr for percentages
of (75:25), (90:10), and pure N2. At each applied voltages of 11, 12, and 13 kV, with increasing percentage of N2 in the (N2:Ne) admixture, the intensity of HXR was found to increase where the low intensity was for percentage of (50:50) of (N2:Ne) and the higher intensity was for pure N2. The results illustrate that the voltage and the composition of working gas are effective parameters in the HXR emission
from a plasma focus device. |
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