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Performance analysis of a Ge/Si core/shell nanowire field-effect transistor
Authors:Liang Gengchiau  Xiang Jie  Kharche Neerav  Klimeck Gerhard  Lieber Charles M  Lundstrom Mark
Affiliation:School of Electrical and Computer Engineering and Network for Computational Nanotechnology, Purdue University, West Lafayette, Indiana 47907, USA. elelg@nus.edu.sg
Abstract:We ana/lyze the performance of a recently reported Ge/Si core/shell nanowire transistor using a semiclassical, ballistic transport model and an sp3d5s* tight-binding treatment of the electronic structure. Comparison of the measured performance of the device with the effects of series resistance removed to the simulated result assuming ballistic transport shows that the experimental device operates between 60 and 85% of the ballistic limit. For this approximately 15 nm diameter Ge nanowire, we also find that 14-18 modes are occupied at room temperature under ON-current conditions with ION/IOFF = 100. To observe true one-dimensional transport in a 110 Ge nanowire transistor, the nanowire diameter would have to be less than about 5 nm. The methodology described here should prove useful for analyzing and comparing on a common basis nanowire transistors of various materials and structures.
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