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铝过渡层沉积CVD金刚石涂层的研究
引用本文:郑琳,左敦稳,徐锋,卢文壮,张旭辉,黄美健,朱良杰.铝过渡层沉积CVD金刚石涂层的研究[J].机械制造与自动化,2012,41(3):27-29,42.
作者姓名:郑琳  左敦稳  徐锋  卢文壮  张旭辉  黄美健  朱良杰
作者单位:南京航空航天大学 抗疲劳制造与表面工程研究所,江苏南京,210016
基金项目:国家自然科学基金,国家自然科学基金,南京航空航天大学2010年度研究生创新基金
摘    要:使用Murakami溶液和王水预处理高钴硬质合金刀片,并用直流磁控溅射(DCS)技术在此硬质合金上溅射铝过渡层,在热丝化学气相沉积(HFCVD)设备里沉积金刚石薄膜;分析了金刚石形核机理,并利用SEM以及Raman等方法表征试样。结果表明:与未溅射过渡层的样品相比,在过渡层上的金刚石形核密度更高,金刚石颗粒尺寸更加细小。

关 键 词:直流磁控溅射技术  铝中间层  金刚石薄膜  高钴硬质合金

Study of CVD diamond coating on Cemented Carbide of PVD-sputtered Al interlayer
ZHENG Lin , ZUO Dun-wen , XU Feng , LU Wen-zhuang , ZHANG Xu-hui , HUANG Mei-jian , ZHU Liang-jie.Study of CVD diamond coating on Cemented Carbide of PVD-sputtered Al interlayer[J].Machine Building & Automation,2012,41(3):27-29,42.
Authors:ZHENG Lin  ZUO Dun-wen  XU Feng  LU Wen-zhuang  ZHANG Xu-hui  HUANG Mei-jian  ZHU Liang-jie
Affiliation:(Research Institution of Anti-fatigue Manufacturing and Surface Engineering,NUAA,Nanjing,210016,China)
Abstract:The WC-10%Co cutting tool material is pre-treated by Murakami solution and aqua regia;then aluminum(Al) is sputtered on the hard-metal by direct current magnetron sputtering(DCS) technology.Diamond thin films are deposited on the cemented carbide by hot filament chemical vapor deposition(HFCVD) process.The diamond nucleation mechanism on the hard-metal is analyzed.The results show that as compared with uncoated Al interlayer sample,its diamond nucleation density is higher and the diamond grain size is smaller.
Keywords:DCS  Al interlayer  diamond thin film  cemented carbide
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