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Microstructure and Magnetic Anisotropy of SmCo-Based Films Prepared via External Magnetic Field Assisted Magnetron Sputtering
Authors:Hao Li  Lu Wei  Yuan Hong  Yuanwei Zhang  Zhaoguo Qiu  Gang Wang  Lizhong Zhao  Xiaolian Liu  Xuefeng Zhang  Deyang Chen  Z. G. Zheng  Weixing Xia  Dechang Zeng  J. Ping Liu
Affiliation:1. School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640 China

Zhongshan R&D Center for Materials Surface and Thin Films Technology of the South China University of Technology, Gent Materials Surface Technology (Guangdong) Co, Ltd, Zhongshan, 528437 China

Zhongshan Institute of Modern Industrial Technology of SCUT, Zhongshan, 528400 China;2. School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640 China

Zhongshan R&D Center for Materials Surface and Thin Films Technology of the South China University of Technology, Gent Materials Surface Technology (Guangdong) Co, Ltd, Zhongshan, 528437 China

Univ. Grenoble Alpes, CNRS, Institut NEEL, 38000 Grenoble, France;3. School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640 China;4. Institute of Advanced Magnetic Materials, College of Materials & Environmental Engineering, Hangzhou Dianzi University, Hangzhou, 310018 China;5. Institute for Advanced Materials, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou, 510006 China;6. Laboratory of Rare-Earth Magnetic Functional Materials, Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, 315201 China;7. Department of Physics, University of Texas at Arlington, Arlington, TX, 76019 USA

Abstract:
Keywords:magnetic anisotropy  magnetic field assisted magnetron sputtering  micromagnetic simulations  SmCo-based films
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