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Modification of negative auto‐photosensitive polyimide
Authors:Jia‐Shen Li  Zuo‐Bang Li  Pu‐Kun Zhu
Abstract:This article describes the preparation of a kind of auto‐photosensitive polyimide (PSPI) that contains organo‐silicone moiety in its main chain. A group of novel auto‐photosensitive polyimides were prepared based on the aromatic diamine monomers and 3,3′,5,5′‐benzophenontetracarboxylic dianhydride (BTDA) by the method of solution polycondensation at room temperature and imidized at a high temperature. The properties of PSPIs, such as ultraviolet (UV) absorption, electric and adhesion properties, and moisture absorption, were characterized by UV analysis, a dielectric constant detector, and so on. The relationship between the structure and properties of PSPIs is discussed. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 77: 943–947, 2000
Keywords:auto‐photosensitive polyimide  polysiloxaneimide  polycondensation
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