| 脉冲激光薄膜制备技术 |
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| 引用本文： | 李美成,杨建平. 脉冲激光薄膜制备技术[J]. 真空与低温, 2000, 6(2): 63-70 |
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| 作者姓名： | 李美成 杨建平 |
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| 作者单位： | [1]哈尔滨工业大学材料科学与工程学院 [2]兰州物理研究所 |
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| 摘 要： | 脉冲激光薄膜沉积是近年来受到普遍关注的制膜新技术。简要介绍了脉冲激光薄膜沉积技术的物理原理、独具的特点和研究发展动态,并介绍了采用脉冲激光薄膜沉积技术制备硅基纳米PtSi薄膜的结果
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| 关 键 词： | 脉冲激光沉积 纳米薄膜 外延生长 红外探测器 |
PULSED LASER DEPOSITION OF THIN FILMS |
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| LI Mei cheng,YANG Jian ping,WANG Jing,WU Gan,LI Yong hua,LEI Zhan xu,ZHAO Lian cheng,CHEN Xue kang. PULSED LASER DEPOSITION OF THIN FILMS[J]. Vacuum and Cryogenics, 2000, 6(2): 63-70 |
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| Authors: | LI Mei cheng YANG Jian ping WANG Jing WU Gan LI Yong hua LEI Zhan xu ZHAO Lian cheng CHEN Xue kang |
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| Affiliation: | LI Mei cheng1,YANG Jian ping2,WANG Jing2,WU Gan2,LI Yong hua2,LEI Zhan xu2,ZHAO Lian cheng1,CHEN Xue kang2 |
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| Abstract: | The pulsed laser deposition is a new technique for the growth of thin films,which has been attended generally by people recently. The physical principle, unique characteristics and the proceeding of the study were introduced briefly. In addation, the result of the PtSi nanometer thin film based on silicon prepared by the pulsed laser deposition was described.PULS |
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| Keywords: | pulsed laser deposition nanometer thin film epitaxial growth infrared detector |
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