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硅溶胶制备纳米二氧化硅的工艺研究
引用本文:孙道兴.硅溶胶制备纳米二氧化硅的工艺研究[J].青岛科技大学学报,2008,29(4).
作者姓名:孙道兴
作者单位:青岛科技大学环境与安全学院,山东青岛266042
摘    要:以碱性硅溶胶和无机酸为原料,水和甲醇为反应介质,加入适宜的分散剂,反应体系在适宜的反应温度和pH值下反应一定时间,经过真空脱水干燥和超细筛网筛分得到稳定的纳米二氧化硅粉体。该方法的最佳工艺条件:反应温度50℃,pH=7.5~8.0,反应体系硅溶胶质量分数10%~20%,反应时间45 min。实验结果表明,制得纳米SiO2粉体的粒径为20~40 nm,比表面积大,分散性好,纯度在99%以上。该方法工艺简单,实用性强,适宜工业化生产。

关 键 词:纳米二氧化硅  化学沉淀法  分散剂  硅溶胶

Preparing Technics of Nano-silica with Silicon Sol
SUN Dao-xing.Preparing Technics of Nano-silica with Silicon Sol[J].Journal of Qingdao University of Science and Technology:Natutral Science Edition,2008,29(4).
Authors:SUN Dao-xing
Abstract:The preparation of nano-silica by chem-deposit method is carried out by using basic silicon sol and inorganic acid as materials.Upon considerable dispersant,reaction temperature and pH value of the reaction system,stable powder nano-silica is obtained through vacuum dehydrate dryness and fine sifting.The optimum conditions are describled as follow: the temperature is at 50 ℃,pH value at 7.5~8.0,the concentration of the reactants 10%~20%,and the reaction time 45 min.The result shows that the prepared nano-silica powder has good dispersivity with 20~40 nm of particle size and its purity exceeds 99%.This method is simply,applicable,and fits the industrial production.
Keywords:nano-silica  chem-depositing method  dispersant  silicon sol
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